An aluminum disk , a silicon wafer and a cd , which are of different electrical conductivity , were employed as the suspended objects respectively 在实验和应用方面，利用自行研制的静电悬浮装置，对不同电学特性的悬浮体进行了静电悬浮实验。
The parts of the photoresist struck by the light can be selectively removed , exposing parts of the silicon wafer in a way that replicates the original pattern 光阻剂受光照射的部份可以选择性移除，因此在晶圆上露出原来图案复制的部份。
The most prevalent procedure is to use photolithography or electron - beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer 最常用的步骤是用光蚀刻或电子束蚀刻法，在矽晶圆表面的光阻层上制作出图案。
Offers the manufacture of products which are non - ferrous metal , cement , metals fabrication , aluminum beverage cans , silicon wafers and electronic components -主要经营钢材黑色金属矿产品铁合金铸铁制品铸锻件有色金属非金属矿产品及制品煤炭及制品等进出口业务
The direct - nitridation of silicon wafer in nitrogen is very important because it involves in silicon wafer ' s heat treatment , ic technics and pulling monocrystal in nitrogen 在硅片的热处理、集成电路工艺和氮气保护的拉晶过程中，都涉及到硅的氮化问题，因此硅片氮气直接氮化的研究意义重大。
An eight - inch silicon wafer usually yields 1 , 000 to 2 , 000 lsis , but the large size of each of our sensors meant that we could only just manage 20 sensors from the same wafer 一个八英?的晶元通常可以生产1000到2000枚大规模集成电路，而由于我们的传感器的大尺寸，以至于同样的晶元只能生产20块传感器。
Back then , chip designers considered it risky to add two or three layers of metal on top of the silicon wafer because each new layer added hills and valleys that made it difficult to keep photolithographic patterns in focus 当时的晶片设计者认为在矽晶圆上加上两三层金属有点冒险，会使晶圆表面凹凸不平，增加光刻过程中聚焦的困难。
Abstract : the progress of the aqueous solution cleaning technology for silicon wafer in very large scale integrated circuit fabrication is reviewed . the future of the aqueous solution cleaning technology is discussed as well 文摘:本文综述了超大规模集成电路制造过程中硅片溶液清洗技术的研究历史及现状，并对技术的未来发展进行了展望。
A method to make blazed silicon gratings is designed . the fabrication of ( 100 ) and ( 111 ) silicon wafer grating is performed by bulk silicon techniques . the surfaces of silicon gratings have been tested by afm 设计了一种制作闪耀硅光栅的方法，利用体硅加工技术分别进行了( 100 )面硅片和( 111 )面硅片光栅的制作，对光栅的表面进行了测试。
